Ion and ion-chemical etching of metal films in dense plasma of RF inductive discharge
DOI:
https://doi.org/10.18321/Keywords:
plasma, etching, metals, induction discharge, filmsAbstract
The results of investigation of sputtering WTi, Ta, Pt, Al, Cu, Сr end Co thin films by Ar ions at the low ion energy (Еi<150 эВ) in Ar plasma and chemical sputtering of Co and Cr in Ar/O2 plasma of RF inductive low pressure discharge are presented. The obtained data set is good consistent with the literature data.
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